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These are articles related to Silicon Lithography. To read an article, click
on a link below.
Silicon-Containing Materials
For Sub-65 nm Etch (PDF size = 560KB)
The use of silicon-containing materials in future lithography schemes should
provide etch-resistant options, while depth of focus and photoresist film
thicknesses continue to decrease.
Bilayer Resist for Sub-65 nm
Lithography (PDF size = 441KB)
A new class of photoresists with high silicon content (23 wt%) achieved 55 nm
features with high etch resistance and low line edge roughness. It also
demonstrated compatibility with the immersion lithography process.
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